Photosensitive resin composition for light blocking layer and light blocking layer using the same

The invention discloses a photosensitive resin composition for a light blocking layer and the light blocking layer using the same. The photosensitive resin composition for the light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical...

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Bibliographic Details
Main Authors JUNG, JU-HO, AHN, KYUNG-WON, CHOI, HYUN-MOO, YU, A-RUM, YIM, JAE-BUM, CHEON, HWAN-SUNG, KIM, JI-HYE
Format Patent
LanguageChinese
English
Published 02.07.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention discloses a photosensitive resin composition for a light blocking layer and the light blocking layer using the same. The photosensitive resin composition for the light blocking layer includes (A) a colorant including a blue material including a dye represented by the following Chemical Formula 1, and a red material, (B) a binder resin, (C) a photopolymerizable monomer, (D) a photopolymerization initiator, and (E) a solvent, and a light blocking layer using the same. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
Bibliography:Application Number: CN201310210568