Calibration unit and method for critical dimension testing

The invention discloses a calibration unit and a method for critical dimension testing. At least a group of Marks are arranged on a Mask. The actual value of DICD is obtained by figures formed on a substrate after an etching process is performed by utilization of the Mask, accordingly, the CD testin...

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Bibliographic Details
Main Authors HUANG YINHU, BAI MINGJI, LIU TONGJUN
Format Patent
LanguageChinese
English
Published 09.04.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention discloses a calibration unit and a method for critical dimension testing. At least a group of Marks are arranged on a Mask. The actual value of DICD is obtained by figures formed on a substrate after an etching process is performed by utilization of the Mask, accordingly, the CD testing results are calibrated. The unit and the method simplify calibration of the DICD testing value and guarantee the calibration precision.
Bibliography:Application Number: CN20121378201