Manufacturing method for patternized film layer and manufacturing method for electrochromic device

• Main Authors: ZHAN RENHONG, XIE HAOLUN, GONG GUOSENG, ZENG RENPEI, LIN TINGJUN, TU JUNHAO
• Format: Patent
• Language: Chinese; English
• Published: 26.03.2014
• Subjects: DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The invention provides a manufacturing method for a patternized film layer. The method includes steps of providing a susbtrate provided with a first face and a second face opposite to the first face; providing a material source towards which the first face of the substrate faces and used for providing a plurality of charge particles; providing a magnetic element; and settling the charge particles on the first face by utilizing the magnetic element, so that a patternized film layer is formed. The second face is arranged between the magnetic element and the first face. A manufacturing method for electrochromic device is also disclosed in the invention.