Molybdenum-tungsten alloy sputtering target material for flat panel display and preparation method thereof
The invention relates to a molybdenum-tungsten alloy plane sputtering target material, and in particular relates to a molybdenum-tungsten alloy sputtering target material for a flat panel display and a preparation method thereof. The target material is prepared from 80-96.5% of molybdenum powder and...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
21.08.2013
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a molybdenum-tungsten alloy plane sputtering target material, and in particular relates to a molybdenum-tungsten alloy sputtering target material for a flat panel display and a preparation method thereof. The target material is prepared from 80-96.5% of molybdenum powder and 3.5-20% of tungsten powder. The preparation method comprises the steps of material preparation, powder blending, mechanical alloying, die filling, isostatic cool pressing, sintering, hot rolling, vacuum annealing and mechanical processing. According to the molybdenum-tungsten alloy sputtering target material and the preparation method thereof provided by the invention, the preparation technology is simple, the requirements for equipment are not high, the investment cost is lower, the prepared target material has good density, and the relative density exceeds 99%; meanwhile, through the technology provided by the invention, the molybdenum-tungsten alloy grain is refined, and the grain structure is optimized; and wh |
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Bibliography: | Application Number: CN20131130857 |