Backside collector structure of power semiconductor device

The invention relates to a backside collector structure of a power semiconductor device. According to the technical scheme provided by the invention, in the backside collector structure of the power semiconductor device, a P conductive-type gallium-nitride layer is arranged on the backside of an N c...

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Bibliographic Details
Main Authors QIU YINGBIN, CHEN HONG, XU CHENGFU, WU KAI, ZHU YANGJUN
Format Patent
LanguageChinese
English
Published 01.05.2013
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Summary:The invention relates to a backside collector structure of a power semiconductor device. According to the technical scheme provided by the invention, in the backside collector structure of the power semiconductor device, a P conductive-type gallium-nitride layer is arranged on the backside of an N conductive-type silicon substrate, and a collector is arranged on the backside of the P conductive-type gallium-nitride layer. According to the invention, a heterojunction structure is manufactured on the backside of the device, so that the injection efficiency is improved, and the conducting voltage drop of the device can be improved; and a heterojunction interface has more defects, so that a recombination center can be formed, and therefore, the service life of current carriers is reduced, and turn-off characteristics are improved.
Bibliography:Application Number: CN2013113013