Backside collector structure of power semiconductor device
The invention relates to a backside collector structure of a power semiconductor device. According to the technical scheme provided by the invention, in the backside collector structure of the power semiconductor device, a P conductive-type gallium-nitride layer is arranged on the backside of an N c...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
01.05.2013
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a backside collector structure of a power semiconductor device. According to the technical scheme provided by the invention, in the backside collector structure of the power semiconductor device, a P conductive-type gallium-nitride layer is arranged on the backside of an N conductive-type silicon substrate, and a collector is arranged on the backside of the P conductive-type gallium-nitride layer. According to the invention, a heterojunction structure is manufactured on the backside of the device, so that the injection efficiency is improved, and the conducting voltage drop of the device can be improved; and a heterojunction interface has more defects, so that a recombination center can be formed, and therefore, the service life of current carriers is reduced, and turn-off characteristics are improved. |
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Bibliography: | Application Number: CN2013113013 |