Photosensitive copolymer and photoresist composition

• Main Authors: KANG SU JIN, AQAD EMAD, ONGAYI OWENDI, THACKERAY JAMES W
• Format: Patent
• Language: English
• Published: 11.03.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A copolymer has the formula: wherein R 1 -R 5 are each independently H, C 1-6 alkyl, or C 4-6 aryl, R 6 is a fluorinated or non-fluorinated C 5-30 acid decomposable group; each Ar is independently a monocyclic, polycyclic, or fused polycyclic C 6-20 aryl group; each of R 7 and R 8 is independently -OR 11 or a - C(CF 3 ) 2 OR 11 group where each occurrence of R 11 is independently H, a fluorinated or non-fluorinated C 5-30 acid decomposable group, or a combination of these; each R 9 is independently F, a C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, or a C 1-10 fluoroalkoxy group; R 10 is a cation-bound C 10-40 photoacid generator-containing group, mole fractions a, b, and d are independently 0 to 0.80, mole fraction c is 0.01 to 0.80, e is 0 to 0.50 provided that where a, b, and d are 0, e is greater than 0, the sum of the mole fractions a+b+c+d+e is 1, 1 and m are independently integers of 1 to 4, and n is an integer of 0 to 5. A photoresist, and a coated substrate, each also include the copolymer.