Colored photosensitive resin composition, color filter, and liquid crystal display device

• Main Authors: KASHIWAGI DAISUKE, KODAMA TOMOHIRO
• Format: Patent
• Language: Chinese; English
• Published: 11.07.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

Disclosed is a colored photosensitive resin composition, which exhibits good patterning properties during development and enables the formation of a fine pattern. Specifically disclosed is a colored photosensitive resin composition, which contains a coloring agent including a black coloring material, an alkali-soluble resin, a polymerizable compound having three or more polymerizable groups, a polymerization initiator or a polymerization initiation system, and a solvent. The colored photosensitive resin composition is characterized in that when a photosensitive resin layer, which contains the colored photosensitive resin composition so as to have an optical concentration of 4.0, is formed on a transparent substrate, and then a first pattern is obtained by exposing and developing the photosensitive resin layer through a mask from a side of the photosensitive resin layer, said side being the reverse side of the transparent substrate-side, under such exposure/development conditions that the line width (W1) of th