Color filtering substrate with scale structure and manufacturing method of color filtering substrate

• Main Authors: KANEKO WAKAHIKO, ZHANG LI
• Format: Patent
• Language: Chinese; English
• Published: 04.07.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The invention provides a color filtering substrate and a manufacturing method thereof. In order to avoid uneven distribution of heights and widths of patterns in the surface of an integral color filtering substrate after exposure due to bending of an exposure masking plate, heights and widths of pattern layers need to be monitored, a special large-sized online microscopic length measuring instrument is required in the prior art and is unfavorable for online control, and simultaneously, cost is increased. A benchmark height shading pattern group, a reference height shading pattern group, a benchmark width shading pattern group and a reference width shading pattern group are added in a non-display region of a transparent glass substrate. During practical production, shading patterns and color filtering patterns which have scale effects can lead manufacturers to see and directly, simply and conveniently confirm dimensional change of shading pattern layers and color filtering layers, accordingly, heights and widt