Cleaning solution composition

The present invention relates to an aqueous cleaning solution composition for removing the contaminant formed in a channel portion of a thin film transition during a manufacturing process of a flat panel display (FPD), and a cleaning method using the same. The aqueous cleaning solution composition o...

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Bibliographic Details
Main Authors KIM SUNG-SIK, BANG SOON-HONG, LEE SEUNG-YONG, YOON HYO-JOONG
Format Patent
LanguageChinese
English
Published 13.06.2012
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:The present invention relates to an aqueous cleaning solution composition for removing the contaminant formed in a channel portion of a thin film transition during a manufacturing process of a flat panel display (FPD), and a cleaning method using the same. The aqueous cleaning solution composition of the present invention has an excellent cleaning power against an organic contaminant, a metal-resist deposit, a metal oxide and a metal complex formed in a channel portion of a thin film transition, and also has excellent corrosion prevention of a metal interconnect formed on a substrate, particularly copper and copper alloy interconnects, and an insulating film. In addition, the aqueous cleaning solution composition of the present invention contains a large amount of deionized water and thus can be easily handled and is environmentally advantageous.
Bibliography:Application Number: CN201080038137