Unsaturated polyster resin compositions containing 2, 2, 4, 4-tetramethyl-1, 3-cyclobutanediol and articles made therefrom
Disclosed are unsaturated polyester resins comprising residues of 1,2-propanediol, 2,2,4,4-tetramethyl-1,3-cyclobutanediol, an aliphatic, cycloaliphatic, or aromatic diacid, and 2-butenedioic acid. Also disclosed are curable compositions containing admixtures of the unsaturated polyesters and aromat...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
04.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are unsaturated polyester resins comprising residues of 1,2-propanediol, 2,2,4,4-tetramethyl-1,3-cyclobutanediol, an aliphatic, cycloaliphatic, or aromatic diacid, and 2-butenedioic acid. Also disclosed are curable compositions containing admixtures of the unsaturated polyesters and aromatic vinyl compounds copolymerizable with the unsaturated polyesters, and coatings and casted and molded articles obtained from the curable compositions. The curable compositions are useful for coatings and and casted and molded articles that have at least one surface that is persistently exposed to organic or aqueous liquids. |
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Bibliography: | Application Number: CN201080006613 |