Second-order nonlinear optical film material and preparation method thereof
The invention provides a second-order nonlinear optical film material based on a p-n junction and a preparation method thereof. The second-order nonlinear optical film material is composed of more than one layer of film materials, an overlapped multilayer film material in a p/n.../p or n/p.../n form...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
14.09.2011
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a second-order nonlinear optical film material based on a p-n junction and a preparation method thereof. The second-order nonlinear optical film material is composed of more than one layer of film materials, an overlapped multilayer film material in a p/n.../p or n/p.../n form is respectively formed by a n-type or p-type semiconductor material; and the semiconductor material at least comprises a layer of p-type and a layer of n-type semiconductor film to form a p-n junction. The preparation method of the second-order nonlinear optical film material comprises a film system structure design and a preparation step of the second-order nonlinear optical film material. The nonlinear optical material of the structure is suitable for designing the second-order nonlinear optical material for high second-order harmonic generation, the practicality of frequency doubling efficiency can be adjusted by changing the thickness of the film and the layers of the film; and the product can be widely applie |
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Bibliography: | Application Number: CN2011180564 |