Plate printing method for mask plate in lithography machine

The invention provides a plate printing method for a mask plate in a lithography machine. The method comprises the following steps of: clamping the mask plate through a plate printing manipulator and moving the mask plate to a position above a mask table; completing joint of the mask plate through a...

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Bibliographic Details
Main Authors ZHENG YEQIN, ZI QIANFENG
Format Patent
LanguageChinese
English
Published 03.10.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention provides a plate printing method for a mask plate in a lithography machine. The method comprises the following steps of: clamping the mask plate through a plate printing manipulator and moving the mask plate to a position above a mask table; completing joint of the mask plate through a plate connecting manipulator and a plate printing manipulator, and placing the mask plate to the mask table by the plate connecting manipulator; and implementing precision pre-alignment of the mask plate by micro motion of the mask table. By the plate printing method for the mask plate in the lithography machine, the requirements for a light source and a sensor during pre-alignment and structure design difficulty and precision of the plate printing manipulator for the mask plate are reduced, the assembly requirement of the plate printing manipulator is reduced simultaneously, and the influence of the mask joint process on the pre-alignment precision is eliminated.
Bibliography:Application Number: CN20101110214