Preparation method of hollow spherical silicon nanomaterial

The invention relates to a preparation method of a hollow spherical silicon nanomaterial. In the preparation method, SiO2 spheres are reduced into the hollow spherical silicon nanomaterial under the reduction action of Mg on SiO2. The hollow spherical silicon nanomaterial is synthesized by the follo...

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Bibliographic Details
Main Authors DU HONGBIN, YOU XIAOZENG, LIU MEIPIN
Format Patent
LanguageChinese
English
Published 10.08.2011
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
METALLURGY
NANOTECHNOLOGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Summary:The invention relates to a preparation method of a hollow spherical silicon nanomaterial. In the preparation method, SiO2 spheres are reduced into the hollow spherical silicon nanomaterial under the reduction action of Mg on SiO2. The hollow spherical silicon nanomaterial is synthesized by the following steps of: (1) synthesizing a SiO2 sphere precursor by using a surfactant; and (2) synthesizing the hollow spherical silicon nanomaterial with a solid-phase magnesium thermal reaction method. Silicon prepared with the preparation method has a hollow spherical structure, and has a rough and loose surface of a sphere, and very high specific surface area. Scanning electron microscope testing indicates that the obtained material is a hollow silicon sphere, and the thickness of a spherical shell is approximately between 50 nanometers and 80 nanometers. Nitrogen adsorption testing at the absolute temperature of 77K indicates that the BET specific surface area of the material is 1,324 m /g.
Bibliography:Application Number: CN201110112182