Gas distribution plate and treatment chamber equipped therewith

• Main Authors: MA HEE-JEON, GEUM BEAM-SEUNG, HA CHOO-GI, GEUM DONG-GOEN, LO DONG-MIIN, LEE DON-HEE
• Format: Patent
• Language: Chinese; English
• Published: 01.06.2011
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention provides a gas distribution plate and a treatment chamber equipped therewith, wherein the manufacture time is shortened and the manufacture cost is reduced.The gas distribution plate comprises a first hole formed on a first surface,through holes extending from the first hole to a second surface opposed to the first surface and at least one second hole with a size greater than the through holes.At least two through holes are connected to the first hole.The second hole extends from the through holes to the second surface.As described above, the first hole is made to be larger, so that at least two through holes are connected to the first hole, thereby shortening the manufacture time of the gas distribution plate and reducing the manufacture cost thereof.