Multilayer mirror and lithographic apparatus

A multilayer mirror is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C lay...

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Bibliographic Details
Main Authors GLUSHKOV DENIS, BANINE VADIM, MOORS JOHANNES HUBERTUS JOSEPHINA, SJMAENOK LEONID AIZIKOVITCH, SALASCHENKO NIKOLAI NIKOLAEVICH
Format Patent
LanguageChinese
English
Published 04.05.2011
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Summary:A multilayer mirror is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers selected from the group consisting of: Cr and Sc layers, Cr and C layers, C and B4C layers, U and B4C layers, Th and B4C layers, C and B9C layers, La and B9C layers U and B9C layers, Th and B9C layers, La and B layers, C and B layers, U and B layers, and Th and B layers.
Bibliography:Application Number: CN20098120621