Heat treatment apparatus

• Main Authors: KAWANO YUMIKO, YONENAGA TOMIHIRO
• Format: Patent
• Language: Chinese; English
• Published: 31.10.2012
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

In-plane temperature of each substrate is uniformly controlled at the time of heating, at the same time, substrates placed on a plurality of susceptors, respectively. A heat treatment apparatus is provided with a plurality of susceptors (120), i.e., conductive members for placing wafers thereon, having an induction heating body (122) electrically divided into a center portion (126) and a peripheral portion (124) thereof; a quartz boat (112) which supports the susceptors in a row; an induction coil (130), which is arranged inside a treatment chamber (102) to surround the circumference of each susceptor and configured such that the temperature of the induction coil can be freely adjusted; and a control section (300) which performs temperature control by changing the ratio between a heat value at the center portion of the induction heating body and that at the peripheral portion, by controlling high frequency currents at two frequencies to be applied to the induction coil from a high frequency current circuit (2