Copper powder for conductive paste, and conductive paste

A copper powder for a conductive paste contains 0.1 atm%-10 atm% of Si (silicon) and 0.1 atm%-10 atm% of In in the particle. It is preferable that the copper powder for a conductive paste contains 0.1 atm%-10 atm% of Ag (silver) in the particle. It is also preferable that the copper powder for a con...

Full description

Saved in:
Bibliographic Details
Main Authors MIYAKE KOICHI, OTA KOYU, YOSHIMARU KATSUHIKO, UWAZUMI YOSHIAKI, KURIMOTO TORU
Format Patent
LanguageChinese
English
Published 13.04.2011
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A copper powder for a conductive paste contains 0.1 atm%-10 atm% of Si (silicon) and 0.1 atm%-10 atm% of In in the particle. It is preferable that the copper powder for a conductive paste contains 0.1 atm%-10 atm% of Ag (silver) in the particle. It is also preferable that the copper powder for a conductive paste contains 0.01 atm%-0.5 atm% of P (phosphorus). The ratio of Si/In (atm ratio) is preferably 0.5-5. The copper powder for a conductive paste is preferably manufactured by an atomization method.
Bibliography:Application Number: CN200980114457