Novel resin and photoresist composition comprising the same

The invention relates to a novel resin and a photoresist composition comprising the same, and provides a resin containing a Lactone unit and a photoresist composition comprising the resin. The invention provides a photoresist composition comprising a resin, the resin contains a part selected from th...

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Bibliographic Details
Main Authors XU CHENG-BAI, ZAMPINI ANTHONY
Format Patent
LanguageChinese
English
Published 12.01.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:The invention relates to a novel resin and a photoresist composition comprising the same, and provides a resin containing a Lactone unit and a photoresist composition comprising the resin. The invention provides a photoresist composition comprising a resin, the resin contains a part selected from the following structural formula; wherein each R2 is a same or different non-hydrogen substituent, and each n is an integer from 0 to 4.
Bibliography:Application Number: CN20101233749