Manufacturing method of hygroscopic resin with low residual monomer content

• Main Authors: SHI KAIYAO, LI YUANZHONG, ZHONG HONGZONG
• Format: Patent
• Language: Chinese; English
• Published: 12.01.2011
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; WORKING-UP

The invention discloses a powdery water-insoluble hygroscopic resin with a low residual monomer content, which can absorb water, urine or blood. The manufacturing method of the hygroscopic resin comprises the following steps of: 1, adding a cross-linking agent to obtain a water solution containing acid radical monomer, which is more than 50mole% in neutralization degree, wherein the acid radical monomer is selected from acrylic acid, methacrylic acid, 2-acrylamide-2-methylpropanesulfonic acid(AMPS) or the mixture thereof; 2, adding an initiator into the monomer solution with the cross-linking agent and retaining the solution on a belt-type reactor; 3, heating two lower sides of the belt; 4, drying, crushing and screening the product under a hot air with a temperature of 100-250 DEG C; 5, coating the cross-linking agent on the surface; 6, heating the surface under a temperature of 80-230 DEG C; and 7, adding inert inorganic salt powder. The manufacturing method can improve the reactivity of the monomers on two