Coating compositions for use with an overcoated photoresist

Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.

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Bibliographic Details
Main Authors ONGAYI OWENDI, WAYTON GERALD B, JAIN VIPUL, COLEY SUZANNE, LIU CONG, ZAMPINI ANTHONY
Format Patent
LanguageChinese
English
Published 05.01.2011
Subjects
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Summary:Coating compositions for use with an overcoated photoresist are provided where the coating composition comprises a resin containing cyanurate groups and hydrophobic groups. The coating composition can enhance resolution of an overcoated photoresist relief image.
Bibliography:Application Number: CN201010233728