Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation

The invention discloses a lithographic apparatus and a method for illumination uniformity correction and uniformity drift compensation. The lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an inte...

Full description

Saved in:
Bibliographic Details
Main Authors ZIMMERMAN RICHARD CARL, KOCHERSPERGER PETER C, CSISZAR SZILARD ISTVAN, STONE ELIZABETH, VLADIMIRSKY OLGA, VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE, KUBICK FREDERICK, DOWNEY TODD R
Format Patent
LanguageChinese
English
Published 22.12.2010
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:The invention discloses a lithographic apparatus and a method for illumination uniformity correction and uniformity drift compensation. The lithographic apparatus including a uniformity correction system is disclosed. Fingers move into and out of intersection with a radiation beam to correct an intensity of the radiation beam. Actuating devices are coupled to the fingers. A width of a tip of each of the fingers is half that of a width of the actuating devices. Systems and methods compensate for uniformity drift. An illumination slit uniformity caused by system drift is measured. First positions of uniformity compensators are determined based on the uniformity. Uniformity compensators are moved to the first respective positions. A substrate is exposed.
Bibliography:Application Number: CN201010249847