Polishing composition for glass substrate

• Main Author: NISHIMOTO KAZUHIKO
• Format: Patent
• Language: Chinese; English
• Published: 24.11.2010
• Subjects: ADHESIVES; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NANOTECHNOLOGY; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

The present invention provides a polishing composition for a glass substrate, containing a silica having an average particle size of primary particles of from 1 to 100 nm, a polymer having a sulfonic acid group, and water; a process for manufacturing a glass substrate with the polishing composition for a glass substrate; and a process for reducing surface stains of a glass substrate with the polishing composition for a glass substrate. The polishing composition for a glass substrate can be suitably used in the manufacture of, for example, glass hard disks, aluminosilicate glass for reinforced glass substrates, and glass ceramic substrate (crystallized glass substrate), and the like. The polymer may be an acrylic acid/sulfonic acid copolymer, and the silica may be a colloidal silica.