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Summary:The invention discloses an implanted bioelectrode based on photoetching and other micro-nano manufacturing technologies and a preparation method thereof. As for the bioelectrode, a metal core wire is coated with an insulating sleeve provided with a spiral metal lead, the spiral metal lead and the insulating sleeve are encapsulated in a polyurethane insulating layer, and an excitation point and a connection end metal ring are respectively connected with the spiral metal lead reserved at the two ends; and the surface of the excitation point is electroplated with inert metal oxides. The technology deposits a layer of metal membrane on the polyurethane insulating sleeve by sputtering or evaporation; the deposited metal membrane is manufactured into an initial spiral structure by the technologies of photoetching, micro contact stamping and etching; the final spiral metal lead is shaped by electro-deposited metal; the sleeve penetrated by the metal core wire is placed in an encapsulating die for encapsulation; a la
Bibliography:Application Number: CN20101180340