Exposure apparatus, exposure method and method of manufacturing a display panel substrate

• Main Author: NEMOTO RYOUJI
• Format: Patent
• Language: Chinese; English
• Published: 18.08.2010
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses an exposure apparatus, exposure method and method of manufacturing a display panel substrate, a spatial light modulator (25) of a beam irradiation apparatus (20) is formed by the arrangement of a plurality of micro reflectors for reflecting the beam in two directions, a drive circuit (27) changes the angle of each reflector according to the drawing data, therefore the beam irradiated to a substrate (1) is modulated. The modulated beam irradiates towards the substrate (1) from the head (20a) of the beam irradiation apparatus (20) containing an irradiation optical system. The drawing data is supplied for the drive circuit (27) of the beam irradiation apparatus (20), the motion of each reflector of the spatial light modulator (25) is monitored, and based on the drawing data supplied for the drive circuit of the beam irradiation apparatus (20) and the monitored motion of each reflector of the spatial light modulator (25), whether the motion of each reflector of the spatial light modulator