Grower of high-purity semi-insulating silicon carbide single crystal
The invention relates to a grower of a high-purity semi-insulating silicon carbide single crystal, belonging to the field of crystal growth. The grower comprises a vacuum chamber, a graphite crucible and an induction coil. The grower of the invention is used for growing the high-purity semi-insulati...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
18.08.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a grower of a high-purity semi-insulating silicon carbide single crystal, belonging to the field of crystal growth. The grower comprises a vacuum chamber, a graphite crucible and an induction coil. The grower of the invention is used for growing the high-purity semi-insulating silicon carbide single crystal based on the technology of physical vapor transport (PVT) without specific growing processes. The invention is mainly characterized in that the side wall of a growing furnace is in a multi-layer (at least three-layer) structure, and more than two independent spaces are formed in the side wall and are respectively used for introducing cooling water and high-purity inert gas (generally, high-purity argon gas) or introducing cooling water and vacuumizing. The grower of the invention can be used for effectively isolating the graphite crucible from air, preventing nitrogen gas in the air from entering the graphite crucible in the growing process and effectively controlling nitrogen elem |
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Bibliography: | Application Number: CN20101152394 |