Solution system of electro-deposited metal Ga and Ga alloy and preparation method thereof

• Main Authors: SUN GUOZHONG, ZHOU ZHIQIANG, SUN DING, AO JIANPING, ZHANG CHAO, HE QING
• Format: Patent
• Language: Chinese; English
• Published: 18.08.2010
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS

The invention discloses a solution system of an electro-deposited metal Ga and a Ga alloy, which comprises the components of metal salt, conductive salt, complexing agent, organic acid, organic additive and dissolvent water, wherein the contents of the above components are as follows: 0.05-0.5 mol/L of metal salt, 1.0-4.0 mol/L of conductive salt, 0.1-0.8 mol/L of complexing agent, 0.5-3.0 mol/L of organic acid and 4-20g/L of organic additive. The solution system adopts alkaline solution with a saturated concentration to regulate the pH value thereof to be within 1-6. The invention has the advantages of good covering capacity and dispersing capacity and long service life; the prepared Ga film is bright and uniform with no defect, and the thickness and components of the metal film can change at random by controlling depositing conditions; and the preparation method is simple and practical, has small equipment investment and low cost, and is suitable for large-scale industrialized application.