Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method

• Main Author: MAKINOUCHI SUSUMU
• Format: Patent
• Language: Chinese; English
• Published: 18.01.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TARIFF METERING APPARATUS; TESTING

A mirror block (30) having moving lattices (34Y, 34X, 36Y, 36X) is secured on the lower surface of a stage. On the upper surface of a stage base facing the lower surface of the stage, fixed lattices (38Y1, 38Y2, 38X) are disposed. Y-encoders (20Y1, 20Y2) for measuring Y-position information of the stage are constituted including the moving lattices (34Y, 36Y) and the fixed lattices (38Y1, 38Y2). Similarly, an X-encoder (20X) for measuring X-position information of the stage is constituted including the moving lattices (34X, 36X) and the fixed lattice (38X).