Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography

• Main Authors: HAUF MARKUS, THIER MICHAEL, FOCHT GERHARD, TAYEBATI PAYAM, SCHOENHOFF ULRICH, HELLWEG DIRK, GRUNER TORALF, KAZI ARIF, GOEHNERMEIER AKSEL, FLUEGGE OLE, SAUERHOEFER ALEXANDER, HEIL TILMANN, WEBER JOCHEN
• Format: Patent
• Language: English
• Published: 25.03.2015
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.