Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography

The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Fu...

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Bibliographic Details
Main Authors HAUF MARKUS, THIER MICHAEL, FOCHT GERHARD, TAYEBATI PAYAM, SCHOENHOFF ULRICH, HELLWEG DIRK, GRUNER TORALF, KAZI ARIF, GOEHNERMEIER AKSEL, FLUEGGE OLE, SAUERHOEFER ALEXANDER, HEIL TILMANN, WEBER JOCHEN
Format Patent
LanguageEnglish
Published 25.03.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTROGRAPHY
FREQUENCY-CHANGING
HOLOGRAPHY
MATERIALS THEREFOR
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Summary:The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
Bibliography:Application Number: CN200880104142