Group iii nitride semiconductor light-emitting device and method for producing the same
A method for producing a Group III nitride semiconductor light-emitting device with a face-up configuration including a p-type layer and a transparent electrode composed of ITO is provided in which a p-pad electrode on the transparent electrode and an n-electrode on an n-type layer are simultaneousl...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
18.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | A method for producing a Group III nitride semiconductor light-emitting device with a face-up configuration including a p-type layer and a transparent electrode composed of ITO is provided in which a p-pad electrode on the transparent electrode and an n-electrode on an n-type layer are simultaneously formed. The p-pad electrode and the n-electrode are composed of Ni/Au. The resultant structure isheat treated at 570 DEG C. and good contact can be established in the p-pad electrode and the n-electrode. The heat treatment also provides a region in the transparent electrode immediately below the p-pad electrode, the region and the p-type layer having a higher contact resistance than that of the other region of the transparent electrode and the p-type layer. Thus, a region of an active layerbelow the provided region does not emit light and hence the light-emitting efficiency of the light-emitting device can be increased. |
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Bibliography: | Application Number: CN200910175610 |