Hardmask composition having antireflective property and method of patterning materials using the same

• Main Authors: KIM JONG SEOB, OH CHANG IL, HYUNG KYUNG HEE, CHEON HWAN SUNG, NAM IRINA, UH DONG SEON, LEE JIN KUK, KIM MIN SOO, YOON KYONG HO, TOKAREVA NATALIYA
• Format: Patent
• Language: Chinese; English
• Published: 01.05.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP