Non-equilibrium magnetron-sputtering rare-earth multivariate graphite composite film and preparation method thereof

• Main Authors: CHEN PENGBO, WANG ZUOPING, LI HAIJUN, ZHANG JINGBIN, HE YUAN, SUN ZHANGTAO
• Format: Patent
• Language: Chinese; English
• Published: 30.12.2009
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a non-equilibrium magnetron-sputtering rare-earth multi-element graphite composite film, which consists of an ion infiltrating metal layer, a Cr/RE transition layer, a C/Cr-RE gradient layer and a C/Cr-RE multi-element composite layer compounded in turn, wherein the components in percentage by mass of the Cr/RE transition layer are 0.1 to 1 percent of RE, and the balance of Cr; and the components in percentage by mass of the C/Cr-RE multi-element composite layer are 3 to 15 percent of Cr, 0.3 to 10 percent of RE, 0.3 to 10 percent of transition metal, and the balance of C. A method for preparing the non-equilibrium magnetron-sputtering rare-earth multi-element graphite composite film comprises the steps of first determining the components of the composite film, calculating the number of rare-earth insert blocks arranged on a high-purity chromium target and a high-purity carbon target, as well as the number of transition metal insert blocks on the high-purity carbon target, preparing an