Exposure system

The invention provides an exposure system comprising an optical source for generating an exposure ray, an optical mask holder for placing an optical mask, a focusing lens system for focusing the exposure ray, and an optical filtering module for reducing the spectral band width of the exposure ray, w...

Full description

Saved in:
Bibliographic Details
Main Authors HUANG DENGYAN, LIN JIAWEI
Format Patent
LanguageChinese
English
Published 02.12.2009
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:The invention provides an exposure system comprising an optical source for generating an exposure ray, an optical mask holder for placing an optical mask, a focusing lens system for focusing the exposure ray, and an optical filtering module for reducing the spectral band width of the exposure ray, wherein the optical mask holder, the focusing lens system and the optical filtering module are all arranged on an optical path of the exposure ray, and the optical filtering module is arranged between the focusing lens system and the optical mask holder.
Bibliography:Application Number: CN20081108808