Double-sided sputtering silvered device of barrel-type quartz crystal

• Main Authors: REN GAOCHAO, GU WEIMIN, JIN HAO, WANG DEMIAO, FENG BIN, LI QIANG
• Format: Patent
• Language: Chinese; English
• Published: 28.10.2009
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; GLASS; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

The invention relates to a double-sided sputtering silvered device of a barrel-type quartz crystal, comprising a vacuum cavity, a vacuum exhaust unit, a work rest, magnetron sputtering targets, a radio frequency plasma cleaner and an inert gas aerator. The vacuum exhaust unit and the inert gas aerator are respectively connected with the vacuum cavity. The double-sided sputtering silvered device is characterized in that the vacuum cavity is provided with the rotatable work rest which is provided with a turnable substrate frame; the substrate frame is provided with a carrier disc which is provided with a quartz crystal sheet and a mask sheet; and at least two magnetron sputtering targets with film shielding covers are arranged at one side of the work rest, and the radio frequency plasma on-line cleaner is arranged at the other side thereof, wherein one magnetron sputtering target is a transition layer sputtering target and others are electrode layer sputtering targets. As multiple targets for magnetron sputteri