Sensor fixing structure and vacuum film deposition apparatus

• Main Authors: NOSE KOUICHI, KOIZUMI YASUHIRO
• Format: Patent
• Language: Chinese; English
• Published: 14.10.2009
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A sensor fixing structure (50) comprises a base material holder (6a) for holding a base material (21a) while cooling the base material with a cooling fluid flowing inside the base material holder, a sensor (55) for detecting physical quantities related to film deposition on the substrate (21a) (hereinafter, referred to as film deposition related quantities), a converter (54) integrated with the sensor (55) to transmit the film deposition related physical quantities and converting the film deposition related physical quantities into a transmission signal, and a container (52) for containing the converter (54) to expose the sensor (55) to the outside. The container (52) is fixed to the base material holder (6a) such that the container can be cooled by the cooling fluid.