Nanometer silica film three-layer stacked solar cell and preparation method thereof

• Main Authors: CHENG GUANGGUI, HE YULIANG, YUAN NINGYI, WANG XIUQIN, DING JIANNING
• Format: Patent
• Language: Chinese; English
• Published: 18.05.2011
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE

The invention relates to a film solar cell and a preparation method thereof, in particular to a nanometer silica film three-layer stacked solar cell and a preparation method thereof. The method of plasma enhanced chemical vapor deposition (PECVD) is adopted for preparing a hydrogenated nanometer silica film (nc-Si:H). An nc-Si:H/nc-Si:H/nc-Si:H film three-layer stacked solar cell is prepared on asoft metal or polyimide film substrate. The top cell, the middle cell and the bottom cell adopt the N<+>NIPP<+> structure. The method of radio frequency sputtering is adopted for depositing an Al/AlxZn[1-x]O double-layer back electrode and an AlxZn[1-x]O film upper electrode. The invention avoids the use of amorphous silicon and expensive amorphous germanium silicon; the relatively thinner nanometer silica film three-layer stacked solar cell with high efficiency and stability is obtained on the soft substrate by taking advantage of the adjustable scope of the band gap of nanometer silica width, the relatively higher a