Batch production type film vapor deposition device using mass substrate installing and uninstalling system

• Main Authors: LEE CHANG-HEE, KIM HAK-NO, CHAO SANGIN
• Format: Patent
• Language: Chinese; English
• Published: 18.04.2012
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention provides a mass production type of film vapor deposition device using a good deal of substrate mounting and load-off systems, including: a first multi-layer substrate fixer (first MSH); a first linear transfer drive section (SDUGL); a second linear transfer drive section (SDUGLS); a vapor deposition transfer drive section; a film vapor deposition chamber (CMS); a third linear transfer drive section; and a fourth linear transfer drive section (SDUGRM).