Semiconductor device and layout method thereof

A semiconductor device and a layout method thereof are provided, each of which contributes to a reduction in layout area and appropriately adjusts an inter-wiring capacitance even where wiring widths and intervals in a plurality of wiring layers differ at a bus wiring comprised of the wiring layers....

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Bibliographic Details
Main Author FUSE MICHINO
Format Patent
LanguageChinese
English
Published 06.03.2013
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Summary:A semiconductor device and a layout method thereof are provided, each of which contributes to a reduction in layout area and appropriately adjusts an inter-wiring capacitance even where wiring widths and intervals in a plurality of wiring layers differ at a bus wiring comprised of the wiring layers. In the semiconductor device, a first functional block and a second functional block are connected to each other, and a plurality of wirings formed over their corresponding wiring layers are provided. The wiring layers have constant wiring widths and wiring intervals for every wiring layer. The number of wirings on each wiring layer is determined, at least in part, by multiplying (a) the total number of required wirings (for all wiring layers) by (b) a ratio of (i) a rate of wirings per unit length on the given layer versus (ii) the sum of the rates of wirings per unit length for each of the plurality of wiring layers. Where the rate of wirings per unit length on a given layer is an inverse of the sum of (x) the de
Bibliography:Application Number: CN200810126964