Microlithography projection objective
Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
03.10.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. |
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Bibliography: | Application Number: CN2006828253 |