Microlithography projection objective

Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

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Bibliographic Details
Main Authors GRUNER TORALF, DODOC AURELIAN, EPPLE ALEXANDER, KAMENOV VLADIMIR, KALLER JULIAN, KRAEHMER DANIEL, OKON THOMAS, FELDMANN HEIKO, CONRADI OLAF
Format Patent
LanguageChinese
English
Published 29.10.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
Bibliography:Application Number: CN2006828253