Modified epoxy ethane washing technique for epoxy ethane/ethylene glycol producing device
The invention discloses an improved process for washing ethylene oxide for an ethylene oxide/ethylene glycol production device. Gas is generated through the reaction with ethene, oxygen, carbon dioxide and ethylene oxide in a gas-to-gas heat exchanger and is cooled in a gas feeding cooler of a cooli...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.06.2010
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses an improved process for washing ethylene oxide for an ethylene oxide/ethylene glycol production device. Gas is generated through the reaction with ethene, oxygen, carbon dioxide and ethylene oxide in a gas-to-gas heat exchanger and is cooled in a gas feeding cooler of a cooling tower. The cooled gas enters into the cooling tower T1. The process is characterized in that recirculating cooling water is used as the cold medium for cooling the gas cooler E1 of the cooling tower, the gas generated after cooling reaction makes the temperature of the feeding gas generated in the cooling tower T1 drop to between 68 and 72 DEG C. The process has the advantages of effectively reducing the temperature of gas feeding in the cooling tower T1, reducing the loss of ethylene oxide and improving the yields of products; adopting recirculating and cooling water to cool the reaction gas, so as to increase the heat transmittion differnce of the feeding gas cooler of the cooling tower, reduce the heat transm |
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Bibliography: | Application Number: CN2008150542 |