Lithographic apparatus and device manufacturing method

A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid (500) between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor (228) includes an array of outlets (224) configure...

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Bibliographic Details
Main Authors MIGCHELBRINK FERDY, BECKERS MARCEL, KATE NICOLAAS TEN, JACOBS JOHANNES HENRICUS WILHELMUS, HOOGENDAM CHRISTIAAN ALEXANDER, KEMPER NICOLAAS RUDOLF, EVERS ELMAR, DONDERS SJOERD NICOLAAS LAMBERTUS
Format Patent
LanguageChinese
English
Published 26.12.2012
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid (500) between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor (228) includes an array of outlets (224) configured to minimize vibrations.
Bibliography:Application Number: CN200810092608