Method for depositing air light-sensitive material on substrate

• Main Authors: PERROTTO JOSEPH A, DALY THOMAS P, LANG CHARLES D, TILTON JAMES N
• Format: Patent
• Language: Chinese; English
• Published: 11.05.2011
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a method for depositing air-sensitive materials of which the performance is negatively affected by the presence of oxygen and/or moisture on a substrate. The method comprises: a. providing a substrate carrier enclosure; b. displacing a cover and arranging the substrate on a carrier support; c. replacing the cover over the substrate on the carrier support; d. introducing an inert gas through a gas inlet at a substantially constant gas flow rate; e. partially displacing the cover to uncover a first portion of the substrate while maintaining the inert gas flow, and depositing the air-sensitive materials to the first portion of the substrate; f. repeating step e with 2th to nth portions of the substrate; and g. replacing the cover over the substrate and support while maintaining the gas flow.