Method for depositing air light-sensitive material on substrate
The invention relates to a method for depositing air-sensitive materials of which the performance is negatively affected by the presence of oxygen and/or moisture on a substrate. The method comprises: a. providing a substrate carrier enclosure; b. displacing a cover and arranging the substrate on a...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
11.05.2011
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention relates to a method for depositing air-sensitive materials of which the performance is negatively affected by the presence of oxygen and/or moisture on a substrate. The method comprises: a. providing a substrate carrier enclosure; b. displacing a cover and arranging the substrate on a carrier support; c. replacing the cover over the substrate on the carrier support; d. introducing an inert gas through a gas inlet at a substantially constant gas flow rate; e. partially displacing the cover to uncover a first portion of the substrate while maintaining the inert gas flow, and depositing the air-sensitive materials to the first portion of the substrate; f. repeating step e with 2th to nth portions of the substrate; and g. replacing the cover over the substrate and support while maintaining the gas flow. |
---|---|
Bibliography: | Application Number: CN200710182122 |