Lithographic apparatus and device manufacturing method

A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of senso data, are provided. In the first aspect, the wavelength variation data is provided to control systems that control focus by mo...

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Bibliographic Details
Main Authors TEEUWSEN JOHANNES WILHELMUS MA, CASTENMILLER THOMAS JOSEPHUS M, MOEST BEARRACH, HAAST MARC ANTONIUS MARIA, BUURMAN ERIK PETRUS
Format Patent
LanguageChinese
English
Published 06.04.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of senso data, are provided. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
Bibliography:Application Number: CN200680018029