Nitrogen ion beam assistant electric arc ion plating deposition TiAlN film layer process

• Main Author: SHUGUO,ZHANG LU
• Format: Patent
• Language: English
• Published: 24.10.2007
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a new TiAIN film sedimenting technique of auxiliary arc ion of nitrogen ion beam, which comprises the following steps: adopting nitrogen ion to plate; cleaning the working piece through alcohol solution; placing the working piece on the rotary disc in the vacuum chamber; extracting the vacuum chamber into 10-2-10-3Pa; starting the rotary mechanism; rotating the rotary disc; aerating nitrogen into vacuum chamber and gas ion source chamber; exerting -550V for the working piece and 12KV for nitrogen in the gas ion source chamber with current strength at 6mA; bombarding the nitrogen ion on the working piece surface for 15min; evaporating titanium-aluminium alloy target; ionizing; sedimenting the film layer; aerating nitrogen with pressure at 3X102Pa in the vacuum chamber; proceeding nitrogen protection for 12 min.