RF plasma supply device

• Main Author: KIRCHMEIER THOMAS,GLUCK MICHAEL,GERHARDT CHRISTOPH,MANN EKKEHARD,HOFSTETTER CHRISTOPH,HINTZ GERD
• Format: Patent
• Language: English
• Published: 17.10.2007
• Subjects: ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS

To provide an HF plasma supply device adjusted very precisely in a predetermined energy region.This HF plasma supply device 1 in order to supply plasma energy to a plasma load 2 includes HF generators 6, 7 for forming a first HF energy signal and a second HF energy signal, a coupling element 8, and...