RF plasma supply device

To provide an HF plasma supply device adjusted very precisely in a predetermined energy region.This HF plasma supply device 1 in order to supply plasma energy to a plasma load 2 includes HF generators 6, 7 for forming a first HF energy signal and a second HF energy signal, a coupling element 8, and...

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Bibliographic Details
Main Author KIRCHMEIER THOMAS,GLUCK MICHAEL,GERHARDT CHRISTOPH,MANN EKKEHARD,HOFSTETTER CHRISTOPH,HINTZ GERD
Format Patent
LanguageEnglish
Published 17.10.2007
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:To provide an HF plasma supply device adjusted very precisely in a predetermined energy region.This HF plasma supply device 1 in order to supply plasma energy to a plasma load 2 includes HF generators 6, 7 for forming a first HF energy signal and a second HF energy signal, a coupling element 8, and an open loop control unit 12 and/or a closed loop control unit 12. In the coupling element 8, HF energy coupled from two HF energy signals is formed, and the plasma load 2 and a compensation load 10 are connected to the coupling element 8. The HF generators 6, 7 are open-loop controlled and/or closed-loop controlled by the open loop control unit 12 and/or the closed loop control unit 12.
Bibliography:Application Number: CN200610130989