RF plasma supply device
To provide an HF plasma supply device adjusted very precisely in a predetermined energy region.This HF plasma supply device 1 in order to supply plasma energy to a plasma load 2 includes HF generators 6, 7 for forming a first HF energy signal and a second HF energy signal, a coupling element 8, and...
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Main Author | |
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Format | Patent |
Language | English |
Published |
17.10.2007
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Subjects | |
Online Access | Get full text |
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Summary: | To provide an HF plasma supply device adjusted very precisely in a predetermined energy region.This HF plasma supply device 1 in order to supply plasma energy to a plasma load 2 includes HF generators 6, 7 for forming a first HF energy signal and a second HF energy signal, a coupling element 8, and an open loop control unit 12 and/or a closed loop control unit 12. In the coupling element 8, HF energy coupled from two HF energy signals is formed, and the plasma load 2 and a compensation load 10 are connected to the coupling element 8. The HF generators 6, 7 are open-loop controlled and/or closed-loop controlled by the open loop control unit 12 and/or the closed loop control unit 12. |
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Bibliography: | Application Number: CN200610130989 |