Pattern forming method and mold

To make the accurate alignment between a disk substrate with a hole formed in the central part of the substrate and a mold possible in forming the structure of a fine pattern using a nano-imprint technique. In the mold with the pattern formed by a fine uneven shape, alignment marks for determining t...

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Bibliographic Details
Main Author OGINO MASAHIKO,MIYAUCHI AKIHIRO,ANDO TAKASHI,HAGINOYA CHISEKI,KOMORIYA SUSUMU,SOHDA YASUNARI,KATAGIRI SOUICHI,OHTA HIROYA,NAKAYAMA YOSHINORI
Format Patent
LanguageEnglish
Published 10.10.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MATERIALS THEREFOR
MICROSTRUCTURAL TECHNOLOGY
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
TRANSPORTING
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Summary:To make the accurate alignment between a disk substrate with a hole formed in the central part of the substrate and a mold possible in forming the structure of a fine pattern using a nano-imprint technique. In the mold with the pattern formed by a fine uneven shape, alignment marks for determining the relative positional relationship between the substrate and the mold are attached in the shape ofa concentric circle to at least two spots. From the positional information or the shape on/of each mark, a broken mark is identified and excluded, and the alignment between the mold and the substratecoated with a resin film is carried out.
Bibliography:Application Number: CN200710002263